• Chinese Journal of Quantum Electronics
  • Vol. 21, Issue 2, 216 (2004)
[in Chinese]1 and [in Chinese]2、*
Author Affiliations
  • 1[in Chinese]
  • 2[in Chinese]
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    DOI: Cite this Article
    [in Chinese], [in Chinese]. Physical and chemical processes and mechanism of pulsed laser ablation of metal oxides[J]. Chinese Journal of Quantum Electronics, 2004, 21(2): 216 Copy Citation Text show less

    Abstract

    Previous works on the theoretical models of pulsed laser ablation were summarized. Our recent studies of the physicochemical processes and mechanisms for pulsed laser ablation of metal oxides were briefly reviewed. A novel thermal-controlling mechanism was proposed for the pulsed laser ablation of metal oxides when the laser fluence was not very high.
    [in Chinese], [in Chinese]. Physical and chemical processes and mechanism of pulsed laser ablation of metal oxides[J]. Chinese Journal of Quantum Electronics, 2004, 21(2): 216
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