• Microelectronics
  • Vol. 53, Issue 3, 465 (2023)
WANG Zhikuan1, FENG Zhihua2, CHEN Rong2, YAN Zipeng3, CUI Wei2, LU Ke2, and LIAO Xiyi3
Author Affiliations
  • 1[in Chinese]
  • 2[in Chinese]
  • 3[in Chinese]
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    DOI: 10.13911/j.cnki.1004-3365.230223 Cite this Article
    WANG Zhikuan, FENG Zhihua, CHEN Rong, YAN Zipeng, CUI Wei, LU Ke, LIAO Xiyi. Research Progress of High Density Interconnection Technology for SiC Power Devices[J]. Microelectronics, 2023, 53(3): 465 Copy Citation Text show less

    Abstract

    Compared with Si material, SiC material is widely used in high frequency and high power applications with high temperature resistance, high voltage resistance and high current resistance due to its superior material properties of large band gap, high thermal conductivity, high breakdown voltage and high electron saturation drift rate. Conventional wire bonding scheme has been one of the most preferred interconnection structures for power modules. However, the technique limits the performance of a SiC power module due to parasitic inductance and heat dissipation issues that are inherent in bonding wires. In this article, low parasitic inductance and high efficient cooling interconnection techniques for Si power modules are introduced first. Then, attempts on developing interconnection techniques for SiC power modules are thoroughly introduced. Finally, challenges in the interconnection of SiC power module are summarized.
    WANG Zhikuan, FENG Zhihua, CHEN Rong, YAN Zipeng, CUI Wei, LU Ke, LIAO Xiyi. Research Progress of High Density Interconnection Technology for SiC Power Devices[J]. Microelectronics, 2023, 53(3): 465
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