Effect of stage moving linear error on exposure in mask moving technique

[in Chinese]; [in Chinese]; [in Chinese]; [in Chinese]; [in Chinese]

Journals >Opto-Electronic Engineering >Volume 34 >Issue 11 >Page 55 > Article

Opto-Electronic Engineering
Vol. 34, Issue 11, 55 (2007)

Effect of stage moving linear error on exposure in mask moving technique

[in Chinese]^1、2、3, [in Chinese]¹, [in Chinese]¹, [in Chinese]¹, and [in Chinese]¹

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¹[in Chinese]

²[in Chinese]

³[in Chinese]

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DOI: Cite this Article

[in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Effect of stage moving linear error on exposure in mask moving technique[J]. Opto-Electronic Engineering, 2007, 34(11): 55 Copy Citation Text

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References

[4] Popovic Zoran D,Sprague Robert A,Neville Connell G A.Technique for monolithic fabrication of microlens array[J].Appl.Opt,1988,27(7):1281-1284.

[6] Ehbets P,Herzig H P,Prongue D.High-efficiency continuous surface-relief gratings for two-dimensional array generation[J].Opt.Lett,1992,13(4):908-910.

[in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Effect of stage moving linear error on exposure in mask moving technique[J]. Opto-Electronic Engineering, 2007, 34(11): 55

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