[1] Kato Y，Mima K，Miyanaga N，et al. Random phasing of high-power lasers for uniform target acceleration and plasma-instability suppression [J]. Phy. Rev. Lett(S0031-9007)，1984，53(11)：1057-1060.

[2] Dixit S N，Lawson J K，Manes K R，et al. Kinoform phase plates for focal plane irradiance profile control [J]. Opt. Lett (S0146-9592)，1994，19(6)：417-419.

[3] Néauport J，Ribeyre X，Daurios J，et al. Design and optical characterization of a large continuous phase plate for laser integration line and laser Megajoule facilities [J]. Appl. Opt(S0003-6935)，2003，42(13)：2377-2382.

[4] Yang C，Zhang R，Xu Q，et al. Continuous phase plate for laser beam smoothing [J]. Appl. Opt(S0003-6935)，2008，47(10)：1465-1469.

[5] Haynam C A，Wegner P J，Auerbach J M，et al. National igition facility lawser performance status [J]. Appl. Opt(S0003-6935)，2007，46(16)：3276-3303.

[6] WANG Bao-he. MARANGONI Drying [J]. Drying Technology & Equipment，2009，7(1)：3-6.

[7] HOU Jing，XU Qiao，LEI Xiang-yang，et al. Removal function of computerized numerical controlled chemical polishing based on the Marangoni interface effect [J]. High Power Laser and Particle Beams，2005，17(4)：555-558.