• Spectroscopy and Spectral Analysis
  • Vol. 42, Issue 1, 310 (2022)
Hong-sheng SUN1、*, Xin-gang LIANG1、1;, Wei-gang MA1、1;, Yu-feng ZHANG3、3;, Chao QIU2、2;, and Yue-gang MA2、2;
Author Affiliations
  • 11. School of Aerospace, Tsinghua University, Beijing 100084, China
  • 22. Beijing Zhenxing Institute of Metrology and Measurement, Beijing 100074, China
  • 33. Bohai University, Jinzhou 121013, China
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    DOI: 10.3964/j.issn.1000-0593(2022)01-0310-06 Cite this Article
    Hong-sheng SUN, Xin-gang LIANG, Wei-gang MA, Yu-feng ZHANG, Chao QIU, Yue-gang MA. Method and Device for Measuring High-Temperature Spectral Emissivity of Non-Conductive Materials Based on Laser Rotation Heating[J]. Spectroscopy and Spectral Analysis, 2022, 42(1): 310 Copy Citation Text show less
    Schematic diagram of measurement based on laser rotation heating
    Fig. 1. Schematic diagram of measurement based on laser rotation heating
    Design scheme of high temperature spectral emissivity measurement device
    Fig. 2. Design scheme of high temperature spectral emissivity measurement device
    Design drawing of sample spectral radiation and temperature field microscopic imaging measurement system
    Fig. 3. Design drawing of sample spectral radiation and temperature field microscopic imaging measurement system
    Temperature field distribution diagram of the silicon carbide sample after entering the steady state
    Fig. 4. Temperature field distribution diagram of the silicon carbide sample after entering the steady state
    Spectral emissivity measurement error introduced by sample unequal temperature
    Fig. 5. Spectral emissivity measurement error introduced by sample unequal temperature
    Diagram of high-temperature spectral emissivity measurement device based on laser heating
    Fig. 6. Diagram of high-temperature spectral emissivity measurement device based on laser heating
    Measurement results of silicon carbide high temperature normal spectral emissivity(a): Normal spectral emissivity of typical spectral points (1 000 K); (b): Normal spectral emissivity of typical temperature points (4 μm)
    Fig. 7. Measurement results of silicon carbide high temperature normal spectral emissivity
    (a): Normal spectral emissivity of typical spectral points (1 000 K); (b): Normal spectral emissivity of typical temperature points (4 μm)
    Comparison of measurement results of silicon carbide normal spectral emissivity (1 000 K)
    Fig. 8. Comparison of measurement results of silicon carbide normal spectral emissivity (1 000 K)
    位置温度/℃
    黑体空腔腔底最大温度1 118.8
    黑体空腔腔底最小温度1 114.1
    黑体空腔腔底平均温度1 116.5
    黑体空腔腔底腔内侧最大温度1 121.8
    黑体空腔腔底腔内侧最小温度1 112.5
    黑体空腔腔底腔内侧平均温度1 117.5
    样品环形区最大温度
    (环外直径10 mm内直径2 mm)
    1 115.1
    样品环形区最小温度
    (环外直径10 mm内直径2 mm)
    1 111.5
    样品环形区平均温度
    (环外直径10 mm内直径2 mm)
    1 113.8
    Table 1. Temperature distribution table of the silicon carbide sample relevant area measurement
    位置温度/℃
    黑体空腔腔底最大温度1 086.4
    黑体空腔腔底最小温度1 071.7
    黑体空腔腔底平均温度1 078.4
    黑体空腔腔底腔内侧最大温度1 103.3
    黑体空腔腔底腔内侧最小温度1 027.4
    黑体空腔腔底腔内侧平均温度1 083.6
    样品环形区最大温度
    (环外直径10 mm内直径2 mm)
    1 081.7
    样品环形区最小温度
    (环外直径10 mm内直径2 mm)
    1 036.0
    样品环形区平均温度
    (环外直径10 mm内直径2 mm)
    1 060.9
    Table 2. Temperature distribution table of the mullite ceramics sample relevant area measurement
    Hong-sheng SUN, Xin-gang LIANG, Wei-gang MA, Yu-feng ZHANG, Chao QIU, Yue-gang MA. Method and Device for Measuring High-Temperature Spectral Emissivity of Non-Conductive Materials Based on Laser Rotation Heating[J]. Spectroscopy and Spectral Analysis, 2022, 42(1): 310
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