Fabrication of 1200 line/mm Laminar Grating for ARPES

Xu Xiangdong; Liu Zhengkun; Qiu Keqiang; Liu Ying; Hong Yilin; Fu Shaojun

doi:10.3788/aos201131.1005008

[1] Ma Dewei, Qiao Shan, Zhang Xinyi et al.. Design of VUV beamline for ARPES studies at SSRF［J］. Opt. & Precision Engng., 2007, 15(12): 1844～1849

[2] Xu Xiangdong, Hong Yilin, Huo Tonglin et al.. Fabrication of laminar grating for synchrotron radiation［J］. Optical Technique, 2001, 27(5): 459～461

[3] Xu Xiangdong. Fabrication of VUV and Soft X-Ray Diffraction Gratings by Holographic Ion Beam Etching Technique［D］. Hefei: University of Science and Technology of China, 2001. 96～114

[4] Fan Shuwei, Zhou Qinghua, Li Hong. Research of optimization design of diffraction grating profile parameters［J］. Acta Optica Sinica, 2010, 30(11): 3133～3139

[5] Liu Quan, Wu Jianhong, Yang Weipeng et al.. Fabrication of linearly chirped phase mask［J］. Chinese J. Lasers, 2009, 36(3): 677～682

[6] Hong Yilin, Liu Liangbao, Zhou Xiaowei et al.. Development of plasma photoresist descum system for large-aperture diffraction gratings［J］. Vacuum, 2008, 45(3): 25～27

[7] Xu Chaoyin, Dong Xiaohao, Zhao Feiyun et al.. Development of KZ-400 ion beam etching facility［J］. Vacuum Science and Technology, 2006, 26(1): 48～53

[8] Wang Haibin, Liu Quan, Wu Jianhong. Fabrication of convex blazed grating by Ar+ ion-beam etching［J］. Acta Optica Sinica, 2011, 31(4): 0405002

[9] N. Destouches, H. P. Herzig, W. Nakagawa et al.. AFM benchmark for the profile characteristation of subwavelength diffractive elements within the EC Network of Excellence on Micro-Optics(NEMO)［C］. SPIE, 2006, 6188: 61881k