• Laser & Optoelectronics Progress
  • Vol. 50, Issue 11, 111404 (2013)
Liu Bin1、* and Liu Yuanyuan2
Author Affiliations
  • 1[in Chinese]
  • 2[in Chinese]
  • show less
    DOI: 10.3788/lop50.111404 Cite this Article Set citation alerts
    Liu Bin, Liu Yuanyuan. 808 nm GaAs/AlGaAs Laser Diode Bar with Current Non-Injection Areas Near the Facets[J]. Laser & Optoelectronics Progress, 2013, 50(11): 111404 Copy Citation Text show less

    Abstract

    After He ion implantation, p-GaAs will obtain higher resistivity than before. To improve the catastrophic optical damage (COD) level of 808 nm GaAs/AlGaAs laser diode bar, about 25 μm-long current non-injection areas are introduced near both facets by He ion implantation. The COD level of a conventional 1 cm laser diode bar with 19 emitters is 30W, while the He ion implantation 1 cm laser diode bar exhibits no COD failure at 42.7 W.
    Liu Bin, Liu Yuanyuan. 808 nm GaAs/AlGaAs Laser Diode Bar with Current Non-Injection Areas Near the Facets[J]. Laser & Optoelectronics Progress, 2013, 50(11): 111404
    Download Citation