• Acta Optica Sinica
  • Vol. 34, Issue 8, 831001 (2014)
Bao Ganghua1、2、*, Jiao Hongfei1、2, Cheng Xinbin1、2, Liu Huasong3, and Wang Zhanshan1、2
Author Affiliations
  • 1[in Chinese]
  • 2[in Chinese]
  • 3[in Chinese]
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    DOI: 10.3788/aos201434.0831001 Cite this Article Set citation alerts
    Bao Ganghua, Jiao Hongfei, Cheng Xinbin, Liu Huasong, Wang Zhanshan. A New Approach to Eliminate Half-Wave Holes in Short-Wave Pass Filters with Layer Inhomogeneity[J]. Acta Optica Sinica, 2014, 34(8): 831001 Copy Citation Text show less

    Abstract

    Short-wave pass filter is an important optical component in high power laser systems which has the repetitive structure of (0.5LH0.5L)N. But its optical property is significantly influenced by the half-wave hole due to layer inhomogeneity. Analysis by admittance theory shows the key reason for the presence of half-wave hole: the end point of the admittance locus of the periodic structure based on the quarter-wave stack doesn′t return to the initial point again. The greater the deviation, the worse the half-wave hole. By inserting matching layers between high and low index materials, a new method is presented to eliminate half-wave hole. The new short-pass film is designed and successfully fabricated, which has a super wide and smooth region with low reflectance at around second harmonic.The experimental results consistent well with the theoretical performance.
    Bao Ganghua, Jiao Hongfei, Cheng Xinbin, Liu Huasong, Wang Zhanshan. A New Approach to Eliminate Half-Wave Holes in Short-Wave Pass Filters with Layer Inhomogeneity[J]. Acta Optica Sinica, 2014, 34(8): 831001
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