[1] Park H D, Dhali S K. Appl. Phys. Letters, 2000, 77(14): 2112.
[2] Han S Uhm, Eun H CHoi, Y Lim. Appl. Phys. Letters, 2002, 80(5): 737.
[3] Masaki Kuzumoto, Shuji Ogawa, Masaki Tanaka, et al. IEEE Journal of Quantum Electronics, 1990, 26(6): 1130.
[4] Joosung Kim, Dongjin Byun, Jin-sang Kim, et al. Journal of Crystal Growth, 2000, 2(10): 478.
[5] Nicolas Gherarid, Steve Martin, Francoise Massines. J. Phys. D: Appl. Phys., 2000, 33(19): L104.
[6] Vidmar R J. IEEE Trans. On Plasma Sci., 1990, 18(4): 733.
[7] Stefanovic I, Bibinov N K, Deryugin A A, et al. Plasma Sources Sci. Technol., 2001, 10(3): 406.
[8] Laroussi M, Alexeff I, Kang W L. IEEE Trams. Plasma Sci., 2000, 28(1): 184.
[9] Roth J R. Phys. Rev. E, 1997, 55(6): 6731.
[10] Hong Y C, Kang S, Hong Y B, et al. Phys. Plasmas, 2009, 16: 123502.
[11] Li X C, Yuan N, Jia P Y, et al. Chem, Phys. Plasmas, 2010, 17: 093540.
[12] Choi J H, Lee T I, Han I, et al. Plasma Sources Sci., Technol., 2006, 15: 416.
