[1] Kogelschatz U. Plasma Chemistry and Plasma Processing, 2003, 23(1): 1.

[2] Kogelschatz U. IEEE Trans. Plasma Sci., 2002, 30(4): 1400.

[3] Breazeal W, Flynn K M, Gwinn E G. Phys. Rev. E, 1995, 52: 1503.

[4] Zanin A L, Gurevich E L, Moskalenko A S, et al. Phys. Rev. E, 2004, 70L: 036202.

[5] Dong L F, Liu F C, Liu S H, et al. Phys. Rev. E, 2005, 72: 046215.

[6] Dong L, Fan W, He Y, et al. Phys. Rev. E, 2006, 73: 066206.

[7] Gerhard J Pietscha, Valentin I. Pure & Appl. Chem., 1996, 70: 1169.