• Optical Instruments
  • Vol. 45, Issue 3, 74 (2023)
Xingyu WANG1, Zhaoqing YANG1, Meng XUE1, and Hanming GUO1、2、*
Author Affiliations
  • 1School of Optical-Electrical and Computer Engineering, University of Shanghai for Science and Technology, Shanghai 200093, China
  • 2Shanghai Key Laboratory of Modern Optical System, University of Shanghai for Science and Technology, Shanghai 200093, China
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    DOI: 10.3969/j.issn.1005-5630.2023.003.010 Cite this Article
    Xingyu WANG, Zhaoqing YANG, Meng XUE, Hanming GUO. Design of microscope objective for laser scanning of MEMS galvanometer[J]. Optical Instruments, 2023, 45(3): 74 Copy Citation Text show less
    Optical scanning path
    Fig. 1. Optical scanning path
    Initial structure of objective lens
    Fig. 2. Initial structure of objective lens
    Final structure of objective lens
    Fig. 3. Final structure of objective lens
    Spot diagram of microscope objective
    Fig. 4. Spot diagram of microscope objective
    MTF curves
    Fig. 5. MTF curves
    Field curves and distortion curves
    Fig. 6. Field curves and distortion curves
    Encircled energy distribution curves
    Fig. 7. Encircled energy distribution curves
    参数名称指标
    波段范围 扫描角度(快轴) 扫描频率(快轴) 反射窗尺寸 整体尺寸 400~1800 nm ±18° 29.3 kHz Ф1.23 mm 28.60 mm×20.42 mm
    Table 1. Related parameters of MEMS galvanometer
    参数指标
    入瞳直径 像方视场角 工作波段 数值孔径 分辨率 物方半视场 工作距 最大外径 总长 1.1 mm ±18° 800~860 nm 0.4 1.26 μm >0.4 mm >0.8 mm <5 mm <25 mm
    Table 2. Objective design criteria
    透镜组初始结构曲率 半径/mm 优化曲率 半径/mm 优化结构 材料
    透镜组1−62.26H-ZF3
    −6.84H-BAK7A
    3.01
    透镜组2−8.46−70.40H-ZF62
    7.55−20.12H-ZLAF90
    36.60−5.75
    透镜组391.85−2.45H-ZF3
    12.643.46H-BAK7A
    −18.58−3.31
    透镜组415.8310.03D-FK61A
    −15.71−2.36H-ZF11
    93.0614.76
    透镜组515.4015.48H-LAK10
    60.69−4.09
    透镜组613.7613.96H-QF8
    −15.724.03H-ZLAF69
    61.4160.11
    透镜组75.362.11H-ZLAF68C
    −8.217.35ZF4
    707.261.82
    Table 3. Data of lens
    Xingyu WANG, Zhaoqing YANG, Meng XUE, Hanming GUO. Design of microscope objective for laser scanning of MEMS galvanometer[J]. Optical Instruments, 2023, 45(3): 74
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