• Laser & Optoelectronics Progress
  • Vol. 52, Issue 6, 63301 (2015)
Dong Shuwen*, Liao Ningfang, Lü Hang, Lin Kai, and Cao Bin
Author Affiliations
  • [in Chinese]
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    DOI: 10.3788/lop52.063301 Cite this Article Set citation alerts
    Dong Shuwen, Liao Ningfang, Lü Hang, Lin Kai, Cao Bin. Chromaticity Changes of Instrument Measurement for Color Patches with Different Gloss Levels[J]. Laser & Optoelectronics Progress, 2015, 52(6): 63301 Copy Citation Text show less

    Abstract

    Chromaticity changes of two instrument measurement for color patches with different gloss levels are investigated. The tristimulus values are predicted based on Dalal-Natale-Hoffman1999 reflection model for thirtyfive color patches printed in five kinds of paper with different gloss levels for three geometrical measurement. For yellow samples and blue samples, a nonlinear fitting algorithm by exponential function is applied to develop the model between gloss and predicted lightness, chroma and hue among three geometrical measurement. The results show that for specular light included (di∶8°) geometries, predicted lightness, predicted chroma and predicted hue are constant. For specular light excluded (de∶8°) and 45°a∶0°geometries, predicted lightness decreased with increasing gloss for all color patches, predicted chroma correspondingly increased and predicted hue was constant. Meanwhile, measured lightness, chroma and hue are used to characterize accuracy of predicting model. The results also illustrate that for yellow samples it is available to predict chromaticity changes of instrument measurement for a wide range of gloss values for the model between gloss and predicted lightness, chroma and hue. However, for blue samples it is unavailable and need to improve.
    Dong Shuwen, Liao Ningfang, Lü Hang, Lin Kai, Cao Bin. Chromaticity Changes of Instrument Measurement for Color Patches with Different Gloss Levels[J]. Laser & Optoelectronics Progress, 2015, 52(6): 63301
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