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Journals >Acta Optica Sinica >Volume 15 >Issue 3 >Page 313 > Article

Acta Optica Sinica
Vol. 15, Issue 3, 313 (1995)

Preliminary Study of Laser Soft X-Ray Approach Lithography

[in Chinese]¹, [in Chinese]¹, [in Chinese]¹, and [in Chinese]²

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¹[in Chinese]

²[in Chinese]

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[in Chinese], [in Chinese], [in Chinese], [in Chinese]. Preliminary Study of Laser Soft X-Ray Approach Lithography[J]. Acta Optica Sinica, 1995, 15(3): 313 Copy Citation Text

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Abstract

Using high- power pulsed laser- produced plasma as soft X- ray source for approach lithography is described in this paper. By applying negative resist PCMS, some new experimental results are obtained.

Keywords

laser-produced plasma lithography resist soft X-ray

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[in Chinese], [in Chinese], [in Chinese], [in Chinese]. Preliminary Study of Laser Soft X-Ray Approach Lithography[J]. Acta Optica Sinica, 1995, 15(3): 313

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