Fast dual-beam alignment method for stimulated emission depletion microscopy using aggregation-induced emission dye resin

Miao Zhao; Fengming Liu; Yang Yu; Xinjun Guo; Hao Ruan; Jing Wen

doi:10.3788/COL202220.113601

Journals >Chinese Optics Letters >Volume 20 >Issue 11 >Page 113601 > Article

Chinese Optics Letters
Vol. 20, Issue 11, 113601 (2022)

Fast dual-beam alignment method for stimulated emission depletion microscopy using aggregation-induced emission dye resin

Miao Zhao^1、2, Fengming Liu³, Yang Yu³, Xinjun Guo¹, Hao Ruan^1、*, and Jing Wen⁴

Author Affiliations

¹Laboratory of Micro-Nano Optoelectronic Materials and Devices, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China

²Center of Materials Science and Optoelectronics Engineering, University of Chinese Academy of Sciences, Beijing 100049, China

³National Center for Protein Science Shanghai, Shanghai 200120, China

⁴Engineering Research Center of Optical Instrument and Systems, Ministry of Education and Shanghai Key Laboratory of Modern Optical System, University of Shanghai for Science and Technology, Shanghai 200093, China

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DOI: 10.3788/COL202220.113601 Cite this Article Set citation alerts

Miao Zhao, Fengming Liu, Yang Yu, Xinjun Guo, Hao Ruan, Jing Wen. Fast dual-beam alignment method for stimulated emission depletion microscopy using aggregation-induced emission dye resin[J]. Chinese Optics Letters, 2022, 20(11): 113601 Copy Citation Text

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