• Laser & Optoelectronics Progress
  • Vol. 55, Issue 6, 061602 (2018)
Xinjian Ma1、1; , Zhihua Si1、1; , Dong Yang1、1; , Tao Lin2、2; , and Shuaichen Feng3、3;
Author Affiliations
  • 1 Information Technology Department, Lhasa Normal College, Lhasa, Tibet 850000, China
  • 2 School of Automation and Information Engineering, Xi'an University of Technology,Xi'an, Shaanxi 710048, China
  • 3 Yangzhou Xinjing Photovoltaic Technology Co., Ltd., Yangzhou, Jiangsu 225653, China
  • show less
    DOI: 10.3788/LOP55.061602 Cite this Article Set citation alerts
    Xinjian Ma, Zhihua Si, Dong Yang, Tao Lin, Shuaichen Feng. Application of Three-Layer Silicon Nitride Antireflection Coatings in Mono-Crystalline Silicon Solar Cells[J]. Laser & Optoelectronics Progress, 2018, 55(6): 061602 Copy Citation Text show less
    References

    [1] Wang J R, Su S B, Zhu G X[J]. Study on matching ability of deposition pressure and diffused sheet resistance for SiNx∶H film Technology and Industry Across the Straits, 2016, 81-82.

    [2] Lü W H, He Y F, Gong Y et al. Effect of double-layer SiNx antireflection/passivation coating on performance of multi-crystalline silicon solar cells[J]. Semiconductor Optoelectronics, 37, 707-711(2016).

    [3] Kumar B, Pandian T B, Sreekiran E et al. Benefit of dual layer silicon nitride anti-reflection coating[C]. Photovoltaic Specialists Conference, 1205-1208(2005).

    [4] Hofstetter J, Canizo C D, Ponce-Alcántara S et al. Optimisation of SiNx∶H anti-reflection coatings for silicon solar cells[C]. Spanish Conference on Electron Devices, 131-134(2007).

    [5] Zoolfakar A S. Syed Othman S R, Abdullan M H, et al. Characterization of silicon and dual layer anti-reflecting coating (ARC) for solar cell applications[J]. International Conference on Information and Multimedia Technology, 543-547(2009).

    [6] Yang W H, Li H B, Wu D X. Design and analysis of anti-reflection coating for solar cells[J]. Journal of Shanghai University (Natural Science Edition), 10, 39-42(2004).

    [7] Cheng L.Three layer anti-reflection. -01-26[P]. passivation film on the surface of solar cell: 201010152139.(2011).

    [8] Xu F, Chen D S, Chen X J et al. Study on three-layer antireflection coating for crystalline silicon solar cells. C]. The 12 th China Photovoltaic Conference , 1-5(2012).

    [9] Sun Z F, Wang W. Study on processing of three-layer silicon nitride antireflection coatings[J]. Science & Technology Information, 12, 4-4(2014).

    [10] Han F, Li J[J]. Exploration of three layers of silicon nitride film deposited on crystalline silicon solar cell Technology Wind, 2015, 64-65.

    [11] Zou K, He J B, Li J et al. Simulation on stack-layer passivation antireflection structure of metallurgical grade silicon solar cells[J]. Electronic Components & Materials, 34, 28-32(2015).

    [12] Ma X J, Lin T, Chen Q B et al. The application of double-layer silicon nitride films on the solar cell anti-reflection coatings[J]. International Journal of Nanomanufacturing, 9, 221-228(2013). http://www.ingentaconnect.com/content/ind/ijnm/2013/00000009/F0020003/art00002

    [13] Ma X J, Lin T. Effect of double-layer SiNx film on mono-crystalline silicon solar cells and XPS characterization[J]. Laser & Optoelectronics Progress, 52, 061608(2015).

    [14] Ma X J, Lin T, Feng S C. Analysis of mono-crystalline silicon solar cells preventing PID coating process[J]. Laser & Optoelectronics Progress, 52, 041601(2015).

    [15] Han P Y, Ji J J, Wang Z G et al. The study of SiO2-SiNx stack-layer passivation films deposited by PECVD[J]. Acta Energiae Solaris Sinica, 31, 1449-1552(2010).

    [16] Wen Z L, Cao X N, Zhou C L et al. Influence of deposition temperature on the SiNx∶H film prepared by plasma enhanced chemical vapor deposition[J]. Acta Physico-Chimica Sinica, 27, 1531-1536(2011).

    Xinjian Ma, Zhihua Si, Dong Yang, Tao Lin, Shuaichen Feng. Application of Three-Layer Silicon Nitride Antireflection Coatings in Mono-Crystalline Silicon Solar Cells[J]. Laser & Optoelectronics Progress, 2018, 55(6): 061602
    Download Citation