• Infrared and Laser Engineering
  • Vol. 35, Issue 6, 667 (2006)
[in Chinese]*, [in Chinese], [in Chinese], [in Chinese], and [in Chinese]
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  • [in Chinese]
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    [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Simulation of Cr atom deposition pattern in a Gauss laser standing field[J]. Infrared and Laser Engineering, 2006, 35(6): 667 Copy Citation Text show less
    References

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    [3] NATARAJAN V,BEHRINGES R E,TENNANT D M,et al.Nanolithography using a laser focused neutral atom beam[J].J Vac Sci Technol,1995,B 13(6):2823-2827.

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    [5] TIMP G,BEHRINGERR E,TENNANTD M,et al.Using light as a lens for submicron,neutral-atom lithography[J].Phys Rev Lett,1992,69(11):1636-1639.

    [6] TANGUY C,REYNAUD S,MATSUOKA M,et al Deflection profiles of a monoenergetic atomic beam crossing a standing light wave[J].Opt Commun,1983,44:249-253.

    [7] BEHRINGER R E.Nanometer-scale lithography using a standing wave atom optical lens[D].New York:Columbia University,1998:10-38.

    [8] BERGGREN K K,PRENTISS M,TIMP G,et al.Calculation of atomic positio ns in nanometer scale direct-write optical lithography with an optical standing wave[J].J Opt Soc Am B,1994,11(7):,1166-1176.

    [9] MCCLELLAND J J.Atom-optical properties of a standingwavelight field[J].J Opt Soc Am B,1995,12(10):1761-1768.

    [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Simulation of Cr atom deposition pattern in a Gauss laser standing field[J]. Infrared and Laser Engineering, 2006, 35(6): 667
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