• Optoelectronic Technology
  • Vol. 40, Issue 3, 195 (2020)
Xiaodong WANG1, Chaomin WANG1, Zhihong FU2, and Jie WANG2
Author Affiliations
  • 1.Chongqing Optoelectronics Research Institute, Chongqing 400060, CHN
  • 2China Academy of Space Technology, Beijing 100094, CHN
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    DOI: 10.19453/j.cnki.1005-488x.2020.03.009 Cite this Article
    Xiaodong WANG, Chaomin WANG, Zhihong FU, Jie WANG. Research on Technology to Enhance the Quantum Efficiency in Ultraviolet Spectral Range of CCD[J]. Optoelectronic Technology, 2020, 40(3): 195 Copy Citation Text show less
    Photo⁃sensitive region structure of traditional CCD
    Fig. 1. Photo⁃sensitive region structure of traditional CCD
    Transmittance curves of different silicon nitride thicknesses
    Fig. 2. Transmittance curves of different silicon nitride thicknesses
    Transmittance curves of different silicon oxide thicknesses
    Fig. 3. Transmittance curves of different silicon oxide thicknesses
    Linear CCD response without HAD structure
    Fig. 4. Linear CCD response without HAD structure
    Linear CCD response with HAD structure
    Fig. 5. Linear CCD response with HAD structure
    Results of ion-implant with different dose and energy
    Fig. 6. Results of ion-implant with different dose and energy
    Results of ion-implant after optimizing the energy and dose
    Fig. 7. Results of ion-implant after optimizing the energy and dose
    SEM pictures before and after silicon nitride etching
    Fig. 8. SEM pictures before and after silicon nitride etching
    Result of optimization of silicon nitride etching
    Fig. 9. Result of optimization of silicon nitride etching
    The photo of ultraviolet linear CCD
    Fig. 10. The photo of ultraviolet linear CCD
    不同厚度Si3N4的平均透射率
    Si3N4厚度/nm0510152025303540

    300 nm~400 nm

    平均透射率/(%)

    56.72967.21278.28185.95886.78281.07471.84462.10953.683
    20 nm Si3N4,不同厚度表层SiO2的平均透射率
    表层SiO2厚度/nm0510152025303540

    300 nm~400 nm

    平均透射率/(%)

    86.78285.34383.06480.22477.10673.96771.02168.43166.320
    Table 1. 波长300 nm~400 nm范围内不同厚度膜层的平均透射率
    谱段B1B2B3B4B5B6B7B8B9B10
    波长范围/nm300~325325~350350~375375~400400~450450~500500~600600~700700~800800~900
    中心波长/nm315340365390425475550650750850
    谱段增量/nm252525255050100100100100
    反射系数0.580.600.610.480.440.420.380.350.350.35
    吸收深度/m0.0080.0110.0210.1330.3640.6781.5473.2297.06317.038
    Table 2. 硅衬底材料对不同波长光子吸收特性
    Xiaodong WANG, Chaomin WANG, Zhihong FU, Jie WANG. Research on Technology to Enhance the Quantum Efficiency in Ultraviolet Spectral Range of CCD[J]. Optoelectronic Technology, 2020, 40(3): 195
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