[1] LI Wenbo, WANG Gang, ZHANG Zhuo, et al.Mask Used for TFT and TFT-LCD [J].Semiconductor Technology, 2010, 35(6): 522-526.
[2] Kim K R, Yi J S, Cho S H, et al. SLM-based Maskless Lithography for TFT-LCD [J]. Applied Surface Science(S0169-4332), 2009, 255(22): 7835-7840 .
[3] LUO Liping, YUN Xiangnan, KIM Kiyong. The Manufacturing and Developing of the TFT-LCD [J]. Advanced Display, 2012, 134(3): 31-38.
[4] Chan K F, FENG Zhiqiang, YANG Ren, et al. High-resolution Maskless Lighography [J]. Society of Photo-Optical Instrumenttation Engineers(S1537-1646), 2003, 2(4): 331-339.
[5] Kim J G, Sim Y S, Cho Y, et al. Large Area Pattern Replication by Nanoimprint Lithography for LCD-TFT Application [J]. Microelectronic Engineering(S1679-9317), 2009, 86(6): 2427-2431.
[6] GUO Xiaowei, DU Jinglei, CHEN Mingyong, et al. Removal of Pixel Structures by Optimizing the Parameters of Imaging System in Digital Photolithography [J]. Acta Photonica Sinica, 2007, 36(3): 462-466.
[7] Shafer D R, Ulrich W. Optical Projection Lens System: US, 6930837 B2[P]. 2004-04-16.
[8] HU Jiasheng. Introduction to Optical Engineering [M]. Dalian: Dalian University of Technology Press, 2005: 290-292.
[9] Michael Bass. Handbook of Optics: Volume II [M]. America: The McGraw-Hill Companies, 2010: 4.1-4.4.
[10] AN Liansheng. Applied Optics [M]. Beijing: Beijing Institute of Technology Press, 2009: 194-196.
[11] Irwin F, West C. Wide Angle Lens with Improved Flat Field Characteristics: US, 4772107 [P]. 1988-09-20.
