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    Journals >Journal of the Chinese Ceramic Society >Volume 53 >Issue 1 >Page 1 > Article
    • Journal of the Chinese Ceramic Society
    • Vol. 53, Issue 1, 1 (2025)
    Effect of Oxygen Flow Rate on Atomic Oxygen Resistance Performance of Siloxane Coatings Deposited by Plasma-Enhanced Chemical Vapor Deposition
    WANG Hu, WANG Lanxi, ZHOU Hui, LI Xuelei..., YANG Miao, LI Kun, NI Zhuang, LI Zhonghua, WANG Zhimin, ZUO Huaping and HE Yanchun|Show fewer author(s)
    Author Affiliations
  • Science and Technology on Vacuum Technology and Physics Laboratory, Lanzhou Institute of Physics, Lanzhou 730000, China
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    DOI: 10.14062/j.issn.0454-5648.20240195 Cite this Article
    WANG Hu, WANG Lanxi, ZHOU Hui, LI Xuelei, YANG Miao, LI Kun, NI Zhuang, LI Zhonghua, WANG Zhimin, ZUO Huaping, HE Yanchun. Effect of Oxygen Flow Rate on Atomic Oxygen Resistance Performance of Siloxane Coatings Deposited by Plasma-Enhanced Chemical Vapor Deposition[J]. Journal of the Chinese Ceramic Society, 2025, 53(1): 1 Copy Citation Text show less
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    WANG Hu, WANG Lanxi, ZHOU Hui, LI Xuelei, YANG Miao, LI Kun, NI Zhuang, LI Zhonghua, WANG Zhimin, ZUO Huaping, HE Yanchun. Effect of Oxygen Flow Rate on Atomic Oxygen Resistance Performance of Siloxane Coatings Deposited by Plasma-Enhanced Chemical Vapor Deposition[J]. Journal of the Chinese Ceramic Society, 2025, 53(1): 1
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