[3] Jackson C, Buck P, Cohen S. DUV laser lithography for photomask fabrication[C]// Proc. 23th Annual BACUS Symp. on Photomask Technol., 2003, 5256: 30-41.
[4] Jackson C, Kiefer R, Buck P. Print characterization of photomasks from next-generation deep-ultra-violet laser pattern generator[C]// Proc. Photomask and Next-Generation Lithography Mask Technology Ⅻ., 2005, 5853: 387-397.
[5] Pang Linyong, Shamma N, Rissman P. Laser and E-beam mask-to-silicon with inverse lithography technology[C]// Proc. 25th Annual BACUS Symp. on Photomask Technol., 2005, 599221: 1-10.
