• Semiconductor Optoelectronics
  • Vol. 41, Issue 5, 681 (2020)
SHU Mingyang*, ZHOU Wen, and CHEN Donghao
Author Affiliations
  • [in Chinese]
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    DOI: 10.16818/j.issn1001-5868.2020.05.015 Cite this Article
    SHU Mingyang, ZHOU Wen, CHEN Donghao. Analysis and Improvement of the Graphic Distortion in Mask Copying Process[J]. Semiconductor Optoelectronics, 2020, 41(5): 681 Copy Citation Text show less

    Abstract

    Mask copying process is often used in the LED industry since it can be produced in large quantities with low cost. Influenced by the flatness of the glass substrate, the optical diffraction effect will cause the distortion of the micron-level graphics in the mask copying process. Aiming at eliminating the graphic distortion in the mask copying process, a method was proposed by adjusting the lithography process and resist thickness. The experiment realized the mask copying process for circular graph with the size of 4μm. The experimental result shows that this method can improve the process of mask copying for micron-level graphics and reduce the cost significantly.
    SHU Mingyang, ZHOU Wen, CHEN Donghao. Analysis and Improvement of the Graphic Distortion in Mask Copying Process[J]. Semiconductor Optoelectronics, 2020, 41(5): 681
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