Jialiang Wang, Xianzhe Liu, Yuxi Deng, Weijian Yuan, Shangxiong Zhou, Xiaochen Zhang, Rihui Yao, Honglong Ning, Junbiao Peng. Fabrication and Optical Properties of Tin Oxide Thin Films by Solution Process[J]. Acta Optica Sinica, 2018, 38(10): 1031001
- Acta Optica Sinica
- Vol. 38, Issue 10, 1031001 (2018)
Fig. 1. White light interference images of tin oxide films with substrates treated by plasma with different powers (edge). (a) Untreated; (b) 12.5 W; (c) 25.0 W; (d) 37.5 W; (e) 50.0 W
Fig. 2. Deposition peak height at thin film edge and substrate surface tension versus plasma treatment power
Fig. 3. Surface morphologies of tin oxide films with substrates treated by plasma with different powers (center). (a) Untreated; (b) 12.5 W; (c) 25.0 W; (d) 37.5 W; (e) 50.0 W
Fig. 4. FTIR spectra of tin oxide films under different annealing temperatures
Fig. 5. XRD patterns of tin oxide films under different annealing temperatures
Fig. 6. Surface morphologies of tin oxide films under different annealing temperatures. (a) Untreated; (b) 300 ℃; (c) 400 ℃; (d) 500 ℃
Fig. 7. UV-Vis transmission spectra of tin oxide films under different annealing temperatures
Fig. 8. Tauc plots of tin oxide films under different annealing temperatures. (a) Untreated; (b) 300 ℃; (c) 400 ℃; (d) 500 ℃
Fig. 9. Visible light average transmittance and optical band gap of tin oxide film versus annealing temperature
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