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    Journals >Opto-Electronic Engineering >Volume 30 >Issue 3 >Page 13 > Article
    • Opto-Electronic Engineering
    • Vol. 30, Issue 3, 13 (2003)
    Fabrication of Continuous Surface Micro-Optical Elements Using Deep Etching Technology
    [in Chinese], [in Chinese], [in Chinese], [in Chinese], and [in Chinese]
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    DOI: Cite this Article
    [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Fabrication of Continuous Surface Micro-Optical Elements Using Deep Etching Technology[J]. Opto-Electronic Engineering, 2003, 30(3): 13 Copy Citation Text show less
    References

    [6] ZHOU Changhe, XI Peng, DAI Enwen et. al. Phase gratings made with inductively coupled plasma technology [J]. SPIE, 2001, 4470: 138-145.

    CLP Journals

    [1] ZHANG Wei-guo, DONG Xiao-chun, DU Chun-lei. Zooming Method for Microlens Array Imaging Photolithography[J]. Opto-Electronic Engineering, 2010, 37(3): 39

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    [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Fabrication of Continuous Surface Micro-Optical Elements Using Deep Etching Technology[J]. Opto-Electronic Engineering, 2003, 30(3): 13
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