[1] K F Lai, A E Rosenbluth, G Han, et al.. Modeling polarization for hyper-NA lithography tools and masks [C]. SPIE, 2007, 6520: 65200D.
[2] D G Flagello, T Milster. 3D modeling of high numerical aperture imaging in thin films [C]. SPIE, 1992, 1625: 246-261.
[3] A K Wong. Optical Imaging in Projection Microlithography [M]. Bellingham, Washington: SPIE Press, 2005. 102-107.
[4] T V Pistor. Electromagnetic Simulation and Modeling with Applications in Lithography [D]. Berkeley: University of California, Berkeley, 2001. 45-87.
[5] K Adam, Y Granik, A Torres, et al.. Improved modeling performance with an adapted vectorial formulation of the Hopkins imaging equation [C]. SPIE, 2003, 5040: 78-91.
[6] P Evanschitzky, A Erdmann, T Fühner. Extended Abbe approach for fast and accurate lithography imaging simulations [C]. SPIE, 2009, 7470: 747007.
[7] D P Peng, P Hu, V Tolani, et al.. Toward a consistent and accurate approach to modeling projection optics [C]. SPIE, 2010, 7640: 76402Y.
[8] Y Chen, Y Liu. A computation of partially coherent imaging illuminated by a polarized source via the stack pupil shift matrix approach [C]. SPIE, 2012, 8326: 832628.
[9] X Ma, Y Q Li, L S Dong. Gradient-based resolution enhancement optimization methods based on vector imaging model [C]. SPIE, 2012, 8326: 83262B.
[10] P Liu, Z F Zhang, S Lan. A full-chip 3D computational lithography framework [C]. SPIE, 2012, 8326: 83260A.
[11] Zhou Yuan. Study on Propagation and Imaging of Light in High Numerical Aperture Lithography [D]. Beijing: University of Chinese Academy of Sciences, 2008. 16-18.
[12] Jaione Tirapu Azpiroz. Analysis and Modeling of Photomask Near-Fields in Sub-Wavelength Deep Ultraviolet Lithography with Optical Proximity Corrections [D]. Los Angeles: University of California, Los Angeles, 2004.
[13] J M Zhou, N V Lafferty, B W Smith, et al.. Immersion lithography with numerical apertures above 2.0 using high index optical materials [C]. SPIE, 2007, 6520: 65204T.
[14] E Wolf. Electromagnetic diffraction in optical systems I. An integral representation of the image field [J]. Proc Roy Soc A, 1959, 253(1274): 349-357.
[15] D G Flagello. Theory of high-NA imaging in homogeneous thin films [J]. J Opt Soc Am A, 1996, 13(1): 53-64.
[16] Li Yanqiu, Dong Lisong, Ma Xu. A Method to Acquire the Full Vector Aerial Image of Mask by Using Abbe Source Integration [P]. 201110424845, 2012-06-13.
