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    Journals >Opto-Electronic Engineering >Volume 35 >Issue 12 >Page 122 > Article
    • Opto-Electronic Engineering
    • Vol. 35, Issue 12, 122 (2008)
    Analysis of Zero Position Error Influencing on Control Algorithm for Fabricating Mesh on the Concave Spherical Substrate by Photolithography Technology
    LIANG Feng-chao*
    Author Affiliations
  • [in Chinese]
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    DOI: Cite this Article
    LIANG Feng-chao. Analysis of Zero Position Error Influencing on Control Algorithm for Fabricating Mesh on the Concave Spherical Substrate by Photolithography Technology[J]. Opto-Electronic Engineering, 2008, 35(12): 122 Copy Citation Text show less
    References

    [2] Maiden A,McWilliam R,Purvis A,et al.Nonplanar photolithography with computer-generated holograms[J].Optics Letters,2005,30(11):1300-1301

    [6] LIANG Fengchao,HU Jun.Key techniques of laser direct writing of fine lines on the spherical surface[J].SPIE,2006,6034:60340G-1-60340G-7

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    LIANG Feng-chao. Analysis of Zero Position Error Influencing on Control Algorithm for Fabricating Mesh on the Concave Spherical Substrate by Photolithography Technology[J]. Opto-Electronic Engineering, 2008, 35(12): 122
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