Ye Hongna, Cao Yiping. Phase Measuring Profilometry Based on Triangular Pattern Grating[J]. Chinese Journal of Lasers, 2011, 38(11): 1108001
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Phase measuring profilometry (PMP) has received great attention in modern life with the advantages of high accuracy and non-contact. However, the application of PMP is limited by the complicated manufacturing technique of sinusoidal grating. Based on the basic theory of PMP, the paper presents the PMP based on the triangular-pattern grating, which is of more practical significance because its manufacturing technique is easier compared to the sinusoidal grating. In this paper, the accuracy of the two methods mentioned above are compared and analyzed. At the same time, the influence of grating period and contrast ratio as well as the maximum height of different objects on the measuring accuracy is analyzed both in ideal and practical conditions. The computer simulations and experiments show that the PMP based on triangular-pattern grating is feasible for its high accuracy.