[1] Y. M. Kim, M. Dahlstrom, S. Lee, M. J. W. Rodwell, and A. C. Gossard, Solid-State Electron. 46, 1541 (2002).

[2] J. H. Jang, G. Cueva, D. C. Dumka, W. E. Hoke, P. J. Lemonias, and I. Adesida, IEEE Photon. Technol. Lett. 13, 151 (2001).

[3] M. K. Lee, D. S. Wuu, and H. H. Tung, J. Appl. Phys. 62, 3209 (1987).

[4] T. W. Kim, M. Jung, T. H. Park, J. W. Cho, and H. L. Park, Thin Solid Films 257, 36 (1995).

[5] M. B. Derbali, J. Meddeb, H. Maaref, D. Buttard, P. Abraham, and Y. Monteil, J. Non. Cryst. Growth 84, 503 (1998).

[6] Z. Zhang, S. Yang, F. Zhang, and D. Li, J. Non-Cryst. Growth 243, 71 (2002).

[7] C.-I. Liao, K.-F. Yarn, C.-L. Lin, Y.-L. Lin, and Y.-H. Wang, Jpn. J. Appl. Phys. 42, 4913 (2003).

[8] J. P. Hirth and X. X. Feng, J. Appl. Phys. 67, 3343 (1989).

[9] Y. Takano, T. Sasaki, Y. Nagaki, K. Kuwahara, S. Fuke, and T. Imai, J. Non-Cryst. Growth 169, 621 (1996).

[10] Y. Okuno, T. Kawano, M. Koguchi, and K. Nakamura, J. Non-Cryst. Growth 137, 313 (1994).

[11] C. Zheng, L. Wang, W. Fang, Y. Pu, J. Dai, and F. Jiang, Acta Opt. Sin. (in Chinese) 26, 463 (2006).

[12] M. Yamaguchi, A. Yamamo, M. Tachikawa, Y. Itoh, and M. Sugo, Appl. Phys. Lett. 53, 2293 (1988).

[13] H. Uchida, T. Soga, H. Nishikawa, T. Jimbo, and M. Umeno, J. Non-Cryst. Growth 150, 681 (1995).

[14] Z. J. Xu, The Foundation of Surface Science of Latter-Day Semiconductor Material (in Chinese) (Peking University Press, Beijing, 1999) p.387.

[15] A. Ren, X. Ren, Q. Wang, D. Xiong, H. Huang, and Y. Huang, Microelectron. J. 37, 700 (2006).

[16] M. A. Hayashi and R. Marcon, Rev. Physicae 1, 21 (2000).

[17] K. Radhakrishnan, K. Yuan, and W. Hong, J. Non-Cryst. Growth 261, 16 (2004).