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    Journals >Acta Optica Sinica >Volume 31 >Issue 2 >Page 222003 > Article
    • Acta Optica Sinica
    • Vol. 31, Issue 2, 222003 (2011)
    Design of High Numerical Aperture Projection Objective for Industrial Extreme Ultraviolet Lithography
    Liu Fei* and Li Yanqiu
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    DOI: 10.3788/aos201131.0222003 Cite this Article Set citation alerts
    Liu Fei, Li Yanqiu. Design of High Numerical Aperture Projection Objective for Industrial Extreme Ultraviolet Lithography[J]. Acta Optica Sinica, 2011, 31(2): 222003 Copy Citation Text show less
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    Liu Fei, Li Yanqiu. Design of High Numerical Aperture Projection Objective for Industrial Extreme Ultraviolet Lithography[J]. Acta Optica Sinica, 2011, 31(2): 222003
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