• Infrared and Laser Engineering
  • Vol. 53, Issue 8, 20240131 (2024)
Hongyan JIANG1, Bing SUN2, Deying CHEN3, Yiqin JI1,3..., Tianhe WANG1 and Rongwei FAN3,*|Show fewer author(s)
Author Affiliations
  • 1Tianjin Jinhang Institute of Technical Physics, Tianjin 300308, China
  • 2Academy of Opto-Electronics, China Electronics Technology Group Corporation, Tianjin 300308, China
  • 3School of Astronautics, Harbin Institute of Technology, Harbin 150080, China
  • show less
    DOI: 10.3788/IRLA20240131 Cite this Article
    Hongyan JIANG, Bing SUN, Deying CHEN, Yiqin JI, Tianhe WANG, Rongwei FAN. High-precision spectral characteristic measurement and characterization system[J]. Infrared and Laser Engineering, 2024, 53(8): 20240131 Copy Citation Text show less
    Schematic diagram of a beam incident on the surface of a sample
    Fig. 1. Schematic diagram of a beam incident on the surface of a sample
    Research plan for high-precision spectral characterization and testing and characterization
    Fig. 2. Research plan for high-precision spectral characterization and testing and characterization
    Optical constants of (a) Ta2O5 and (b) SiO2
    Fig. 3. Optical constants of (a) Ta2O5 and (b) SiO2
    Theoretical design transmittance curve of narrow-band filter
    Fig. 4. Theoretical design transmittance curve of narrow-band filter
    Schematic diagram of ion beam sputtering deposition
    Fig. 5. Schematic diagram of ion beam sputtering deposition
    Multi-temperature step annealing
    Fig. 6. Multi-temperature step annealing
    High precision spectral characteristic test curve
    Fig. 7. High precision spectral characteristic test curve
    High precision spectral characteristic testing at different angles
    Fig. 8. High precision spectral characteristic testing at different angles
    ParameterTa2O5SiO2
    Ion beam voltage/V12501250
    Ion beam current/mA600600
    Acceleration voltage/V250250
    E/B150%150%
    Sedimentation rate/nm·s−10.300.20
    Argon gas flow rate/mL·min−11818
    Oxygen flow rate/mL·min−13030
    Base temperature/℃150150
    Table 1. Processing parameter for preparing Ta2O5 and SiO2 films
    Data sourcesCenter wavelength/nmPeak transmittanceHalf height width/nm
    UV3600531.8059.75%1.05
    V-5002531.2057.26%1.10
    High precision test532.0087.23%0.79
    Table 2. High precision spectral characteristic test results
    Hongyan JIANG, Bing SUN, Deying CHEN, Yiqin JI, Tianhe WANG, Rongwei FAN. High-precision spectral characteristic measurement and characterization system[J]. Infrared and Laser Engineering, 2024, 53(8): 20240131
    Download Citation