Research status of the technical parameters of the pulsed laser deposited ferroelectric thin films

[in Chinese]; [in Chinese]; [in Chinese]

Journals >Infrared and Laser Engineering >Volume 36 >Issue 2 >Page 175 > Article

Infrared and Laser Engineering
Vol. 36, Issue 2, 175 (2007)

Research status of the technical parameters of the pulsed laser deposited ferroelectric thin films

[in Chinese]^1、2、*, [in Chinese]², and [in Chinese]³

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¹[in Chinese]

²[in Chinese]

³[in Chinese]

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[in Chinese], [in Chinese], [in Chinese]. Research status of the technical parameters of the pulsed laser deposited ferroelectric thin films[J]. Infrared and Laser Engineering, 2007, 36(2): 175 Copy Citation Text

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Abstract

[in Chinese], [in Chinese], [in Chinese]. Research status of the technical parameters of the pulsed laser deposited ferroelectric thin films[J]. Infrared and Laser Engineering, 2007, 36(2): 175

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