[1] D. E. Zelmon, H. E. Jackson, J. T. Boyd et al.. A low-scattering graded-index SiO2 planar optical waveguide thermally grown on silicon. Appl. Phys. Lett., 1983, 42(7): 565～566

[2] N. Imoto, N. Shimizu, H. Mori et al.. Sputtered silica waveguides with an embedded three-dimensional structure. J. Lightwave Technol., 1983, LT-1: 289～293

[3] M. Kawachi, M. Yasu, T. Edahiro. Fabrication of SiO2-TiO2 glass planar optical waveguides by flame hydrolisis deposition. Electron. Lett., 1983, 19(15): 583～584

[4] C. H. Henry, R. F. Kazarinow, H. J. Lee et al.. Lowloss Si3N4-SiO2 optical waveguides on Si. Appl. Opt., 1987, 26(13): 2621～2624

[5] G. Grand, J. P. Jadot, H. Denis et al.. Low-loss PECVD silica channel waveguides for optical communications. Electron. Lett., 1990, 26(25): 2135～2137

[6] L. L. Hench, W. Vasconcelos. Gel-silica Science. Annu. Rev. Mater. Sci., 1990, 20: 269～298

[7] K. Kamiya, S. Sakka, Y. Tatemichi. Preparation of glass fibres of the ZrO2-SiO2 and Na2O-ZrO2-SiO2 systems from metal alkoxides and their resistance to alkaline solution. J. Mater. Sci., 1980, 15(7): 1765～1771

[8] P. Hinz, H. Dislich. Anti-reflecting light-scattering coatings via the sol-gel-procedure. J. Non-Cryst. Solids, 1986, 82(1～3): 411～416

[9] Lin Yang, S. S. Saavedra, N. R. Armstrong et al.. Fabrication and characterization of low-loss, sol-gel planar waveguides. Anal. Chem., 1994, 66(8): 1254～1263

[10] R. Ulrich, R. Torge. Measurement of thin film parameters with a prism coupler. Appl. Opt., 1973, 12(12): 2901-2908