Fabrication of Low-loss Silica on Silicon Waveguides with Sol-Gel Techniques

[in Chinese]; [in Chinese]; [in Chinese]; [in Chinese]; [in Chinese]; [in Chinese]

Journals >Chinese Journal of Lasers >Volume 26 >Issue 3 >Page 253 > Article

Chinese Journal of Lasers
Vol. 26, Issue 3, 253 (1999)

Fabrication of Low-loss Silica on Silicon Waveguides with Sol-Gel Techniques

[in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], and [in Chinese]

Author Affiliations

[in Chinese]

show less

DOI: Cite this Article Set citation alerts

[in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Fabrication of Low-loss Silica on Silicon Waveguides with Sol-Gel Techniques[J]. Chinese Journal of Lasers, 1999, 26(3): 253 Copy Citation Text

show less

Abstract

Low loss SiO2 TiO2 waveguides were fabricated with sol gel techniques. Propagation loss of 0.57 dB/cm was obtained at 633 nm. A Y branch channel beam splitter was also fabricated on a Si substrate. The branch ratio is approximately 1∶1.

Keywords

sol-gel techniques Y branch splitter waveguides

Download Citation

Set citation alerts for the article

Tools

Set citation alerts for the article

Save the article for my favorites

Paper Information