Pulse compressed gratings (PCG) used in chirped-pulse amplification system and based on multi-layer thin film stack are etched with ion-beam and holographic techniques. Diffraction efficiency and laser induced damage threshold are determined by the structure of the parameter of gratings, on the other hand, by the design of multi-layer dielectric greatly. A multi-layer dielectric stack design used at 1053 nm and exposed at 413.1 nm is given. The influence of the structure on the optical character is described in detail. The analysis shows that H3L (H2L)9H0.5L2.03H films meet the requirements of PCG. The sample was prepared by ZZX-800 vacuum machine with e-beam gun, and its optical character is given. Transmittance is less than 0.5% at using wavelength and above 90% at exposing wavelength. Results show that the optical property is excellent and there is a good agreement between the measured transmittance and the design.