• Acta Optica Sinica
  • Vol. 25, Issue 10, 1433 (2005)
[in Chinese]*, [in Chinese], [in Chinese], [in Chinese], [in Chinese], and [in Chinese]
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  • [in Chinese]
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    [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Optimized Design and Fabrication of X-Ray W/B4C Broadband Multilayer Film[J]. Acta Optica Sinica, 2005, 25(10): 1433 Copy Citation Text show less

    Abstract

    A method of selecting and confirming materials with W and B4C for X-ray broadband multilayer film is presented. The minimum bilayers number of X-ray broadband multilayer film has been confirmed by using BERNING formula at the wavelength 0.154 nm. After introducing the suitable merit function, a broad angular broadband W/B4C multilayer film has been designed successfully by using genetic algorithm. The flat reflectance of broadband multilayer film is 40% in the wavelength 0.154 nm at the grazing incidence angel (θ) of 0.5°~0.9°. The multilayer film has been fabricated on the magnetron sputtering system. A flat relative reflectance spectrum curve has been measured at the grazing incidence angle (2θ) of 1.0°~1.8° by X-ray diffractometer.
    [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Optimized Design and Fabrication of X-Ray W/B4C Broadband Multilayer Film[J]. Acta Optica Sinica, 2005, 25(10): 1433
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