New device on measuring thin film stress by laser reflect measurement

[in Chinese]; [in Chinese]; [in Chinese]

Journals >Infrared and Laser Engineering >Volume 36 >Issue 5 >Page 693 > Article

Infrared and Laser Engineering
Vol. 36, Issue 5, 693 (2007)

New device on measuring thin film stress by laser reflect measurement

[in Chinese]^*, [in Chinese], and [in Chinese]

Author Affiliations

[in Chinese]

show less

DOI: Cite this Article

[in Chinese], [in Chinese], [in Chinese]. New device on measuring thin film stress by laser reflect measurement[J]. Infrared and Laser Engineering, 2007, 36(5): 693 Copy Citation Text

show less

References

[5] STONEY G.The tensions of metalic films deposited by electroplating[J].Proe Royal Society,1990,82:172.

[6] YTATSUMI,MSHIGI,MHIRATE.Measurment of youny's modulus in amorphous ailicon whiskers[J].Jpn J Appl Phys,1978,17(8):1455-1466.

[7] MIYAYI M,FUNAKOSBL N.Internal stress and thermal expansion coefficient of GDs-si.filmes[J].Jpn J Appl Phys,1981,20(1):289-292.

[8] HEARNE S,CHARSON E,HAN J,et al.Stress evolution during metalorganic chemical vapor deposition of GaN[J].Appl Phys Lett,1999,74(3):356-361.

CLP Journals

[1] WANG Yu-bo, LI Yu-long, WANG Wen-qin, ZHANG Hua, CUI Qing-bo. Intrinsic Stress Monitoring During the Chemical Coating Processes Based on Fiber Grating Sensing[J]. Acta Photonica Sinica, 2016, 45(8): 806004

[in Chinese], [in Chinese], [in Chinese]. New device on measuring thin film stress by laser reflect measurement[J]. Infrared and Laser Engineering, 2007, 36(5): 693

Download Citation

Tools

Save the article for my favorites

Paper Information