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    Journals >Opto-Electronic Engineering >Volume 34 >Issue 11 >Page 50 > Article
    • Opto-Electronic Engineering
    • Vol. 34, Issue 11, 50 (2007)
    Influence of fabrication error in ion beam etching on diffractive optical element
    [in Chinese]1, [in Chinese]1, [in Chinese]1, [in Chinese]2, and [in Chinese]1、3
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  • 1[in Chinese]
  • 2[in Chinese]
  • 3[in Chinese]
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    [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Influence of fabrication error in ion beam etching on diffractive optical element[J]. Opto-Electronic Engineering, 2007, 34(11): 50 Copy Citation Text show less

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    [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Influence of fabrication error in ion beam etching on diffractive optical element[J]. Opto-Electronic Engineering, 2007, 34(11): 50
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