[3] J. P. Kirk, C. J. Progler. Pupil illumination: in-situ measurement of partial coherence[C]. Proc. SPIE, 1998, 3334: 281～288
[4] Kazuya Sato, Satoshi Tanaka, Tadahito Fujisawa et al.. Measurement of effective source shift using a grating-pinhole mask[C]. Proc. SPIE, 1999, 3679: 99～107
[5] Stephen P. Renwick, Steve D. Slonaker, Ivan Lalovic et al.. Influence of laser spatial parameters and illuminator pupil-fill performance on the lithographic performance of a scanner[C]. Proc. SPIE, 2002, 4691: 1400～1411
[6] Gary Zhang, Changan Wang, Colin Tan et al.. Illumination pupil fill measurement and analysis and its application in scanner V-H bias characterization for 130 nm node and beyond[C]. Proc. SPIE, 2003, 5040: 45～56
[7] Donis G. Flagello, Robert Socha, Xuelong Shi et al.. Optimizing and enhancing optical systems to meet the low k1 challenge[C]. Proc. SPIE, 2003, 5040: 139～150
[8] Christopher Progler, Hong Du, Greg Wells. Potential causes of across field CD variation[C]. Proc. SPIE, 1997, 3051: 660～671
[9] M. Born, E. Wolf. Principles of Optics[M]. 7th ed. Cambridge: Pergamon Press, 1999. 599～606
[10] Jin-Ha Kim, Seok-Hwan Oh, Dong-Sean Lee. Pattern deformation induced from intensity-unbalance off-axis illumination[C]. Proc. SPIE, 1997, 3051: 54～65
[11] Jarry J. Levinson. Principles of Lithography[M]. Bellingham Washington, SPIE Press, 2001. 36～52
[12] Aaron Hand. Mix-and-match lithography tackles tighter requirements[J]. Semiconductor International, 2003. 15～23
