[1] Su Jiancang, Wang Limin, Ding Yongzhong, . Analysis and design of series resonant charging power supply[J]. High Power Laser and Particle Beams, 16, 1611-1614(2004).
[2] Fan Shengwen, Cai Binfeng, Wang Zeting. Research on series resonant electron beam welding filament power supply[J]. Chinese Journal of Power Sources, 40, 1113-1115,1121(2016).
[3] Huang Xinbo, Liu Bin, Zhang Zhouxiong, . Design of digital controller for frequency-tuned series resonance power source[J]. Electric Power Automation Equipment, 36, 138-142,155(2016).
[4] Zhong Heqing, Xu Zhixin, Zou Yunping, . Effects of parasitical capacitors on charging characteristic of series resonant CCPS[J]. Proceedings of the CSEE, 25, 40-44(2005).
[5] Liao Yongfu, Lin Lei, Li Ao, . Resonant parameters design method and current control strategy of phase-shifted series resonant high-voltage capacitor charging power supply[J]. Transactions of China Electrotechnical Society, 31, 83-92(2016).
[6] Gan Yanqing, Song Falun, Li Fei, . Design and experimental research of high power repetitive pulse charging power supply[J]. High Power Laser and Particle Beams, 30, 065003(2018).
[7] Liu Kun, Fu Rongyao, Gao Yinghui, . Design of control system of high voltage repetition frequency charging power supply[J]. High Power Laser and Particle Beams, 28, 045001(2016).
[8] Li Wei, Liu Qingxiang, Zhang Zhengquan. Capacitor charging power supply with constant power input and constant current output[J]. High Power Laser and Particle Beams, 28, 075003(2016).
[9] Gao Yinghui, Shi Xiaoxia, Yan Ping. High power density capacitor charging power supply[J]. High Power Laser and Particle Beams, 24, 943-948(2002).
[10] Zhang Xiaolong. Research on series resonant softswitching capacit ging power supply[D]. Wuhan: Huazhong University of Science Technology, 2009: 5
[11] Feng Chuanjun, He Yang, Dai Wenfeng, . Design and analysis of series resonant high voltage capacitor charging power supply[J]. High Power Laser and Particle Beams, 31, 055002(2019).
[12] Li Bo, Zhao Juan, Li Hongtao, . Design of new power source for plasma magnetron sputtering coating[J]. High Power Laser and Particle Beams, 31, 040020(2019).
