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    Journals >Opto-Electronic Engineering >Volume 32 >Issue 12 >Page 17 > Article
    • Opto-Electronic Engineering
    • Vol. 32, Issue 12, 17 (2005)
    Diffraction
    [in Chinese]1, [in Chinese]2, and [in Chinese]1、2
    Author Affiliations
  • 1[in Chinese]
  • 2[in Chinese]
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    DOI: Cite this Article
    [in Chinese], [in Chinese], [in Chinese]. Diffraction[J]. Opto-Electronic Engineering, 2005, 32(12): 17 Copy Citation Text show less
    References

    [1] SIEGMANA.E.Lasers[M].California:University Science Books Mill Valley,1986.712-743.

    [3] GU Min,GAN X.S.Fresnel diffraction by circular and serrated apertures illuminated withan ultrashort pulsed-laser beam[J].J.Opt.Soc.Am,1996,A 13(4):771-778.

    [4] GORI F,GUATTARI G,PADOVANI C.Bessel-Gauss Beams[J].Opt Commun,1987,64(6):491-495.

    CLP Journals

    [1] ZHANG Chun-hui, CHEN Long-jiang, LIANG Yi-yong, YANG Guo-guang. Two-spectrum Method for Measuring the Thickness of Photoresist in Lithography Techniques[J]. Opto-Electronic Engineering, 2009, 36(5): 52

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    [in Chinese], [in Chinese], [in Chinese]. Diffraction[J]. Opto-Electronic Engineering, 2005, 32(12): 17
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