• Optics and Precision Engineering
  • Vol. 17, Issue 4, 787 (2009)
LI Yu-dong1,2,*, REN Jian-yue1, JIN Long-xu1, and ZHANG Li-guo1
Author Affiliations
  • 1[in Chinese]
  • 2[in Chinese]
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    DOI: Cite this Article
    LI Yu-dong, REN Jian-yue, JIN Long-xu, ZHANG Li-guo. Total dose effects and radiation damage reasons of VLSI SRAM and ROM storages[J]. Optics and Precision Engineering, 2009, 17(4): 787 Copy Citation Text show less
    References

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    [2] CESTER A,GERARDIN S,PACCAGNELLA A,et al..Drain current decrease in MOSFETs after heavy ion irradiation[J].IEEE Trans Nucl Sci,2004,51(6):3150-3157.

    [3] AMMENDOLA G,ANCARANI V,TRIOLO V,et al..Nanocrystal memories for FLASH device applications[J].Solid-State Electron,2004,48(9):1483-1488.

    [4] LU W,GUO Q,REN D Y,et al..Analyses of the CMOS op-amps’damage in irradiation environment[J].Nuclear Techniques,2002,25(3):218-222.(in Chinese)

    [5] HE CH H,GENG B,YANG H L,et al..Mechanism of radiation effects in floating gate ROMs[J].Acta Physica Sinica,2003,52(9):2235-2238.(in Chinese)

    [6] HAO ZH H,WANG X D,Mass solid state recorder technology[J].Opt.Precision Eng.,2001,9(4):396-400.(in Chinese)

    [7] LIU L SH,LIU S,WANG W X,et al..Optical properties and material growth of GaAs(110) quantum wells[J].Opt.Precision Eng.,2007,15(5):678-683.(in Chinese)

    [8] BAI Y H,YANG X L,YAN H.China in quantum optics and quantum information[J].Opt.Precision Eng.,2007,15(5):684-698.(in Chinese)

    LI Yu-dong, REN Jian-yue, JIN Long-xu, ZHANG Li-guo. Total dose effects and radiation damage reasons of VLSI SRAM and ROM storages[J]. Optics and Precision Engineering, 2009, 17(4): 787
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