• Chinese Optics Letters
  • Vol. 3, Issue 0s, 141 (2005)
[in Chinese], [in Chinese], [in Chinese], and [in Chinese]
Author Affiliations
  • Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800
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    [in Chinese], [in Chinese], [in Chinese], [in Chinese]. High-efficiency diffraction gratings in fused silica at the wavelength of 632.8 nm[J]. Chinese Optics Letters, 2005, 3(0s): 141 Copy Citation Text show less

    Abstract

    We describe high-efficiency diffraction gratings fabricated in fused silica at the wavelength of 632.8 nm by rigorous coupled-wave analysis (RCWA). High-density holographic gratings, if the groove density falls within the range of 1575-1630 lines/mm and the groove depth within the range of 1.1-1.3 microns, can realize high diffraction efficiencies at the wavelength of 632.8 nm, e.g., the first Bragg diffraction efficiency can theoretically achieve more than 93% both in TE- and TM-polarized incidences, which greatly reduces the polarization-dependent losses. Note that with different groove profiles further optimized, the maximum efficiency of more than 99.69% can be achieved for TM-polarized incidence, or 97.81% for TE-polarized incidence.
    [in Chinese], [in Chinese], [in Chinese], [in Chinese]. High-efficiency diffraction gratings in fused silica at the wavelength of 632.8 nm[J]. Chinese Optics Letters, 2005, 3(0s): 141
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