Jing ZHANG, Haicheng LIU, Xiuhua FU, Shengqi WANG, Fei YANG. Research on Improving the Uniformity of Optical Communication Filter Film by Ion Beam Etching[J]. Acta Photonica Sinica, 2022, 51(12): 1216001
- Acta Photonica Sinica
- Vol. 51, Issue 12, 1216001 (2022)
Fig. 1. DWDM theoretical design curve
Fig. 2. Rotating plane fixture geometry configuration
Fig. 3. The theoretical and actual film thickness distribution curves of the two materials without ion source assistance
Fig. 4. Film thickness distribution curves of the two materials with and without ion source assistance
Fig. 5. The energy distribution curve corresponding to different acceleration voltages of the focused ion source
Fig. 6. Correspondence between film uniformity and ion source acceleration voltage
Fig. 7. The energy distribution of the ion source under different ion source voltages
Fig. 8. Uniformity of the two materials under different ion source voltages
Fig. 9. Film thickness distribution curves of two materials under different ion source currents
Fig. 10. The etching rate of the two materials under different ion source currents.
Fig. 11. Film thickness distribution curve of SiO2 monolayer film under different ion source parameters
Fig. 12. Schematic diagram of calculating method of measuring point and effective coating area
Fig. 13. Spectral test curve
Fig. 14. Material optical constants
Fig. 15. Improved filter film spectrum curve
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Table 1. Technical requirements for narrowband filter film
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Table 2. Process parameters of two materials
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Table 3. Ion source parameters
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Table 4. Uniformity of the two materials under different ion source acceleration voltages
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Table 5. Uniformity of the two materials under different ion source voltages
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Table 6. Uniformity of the two materials under different ion source currents
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Table 7. The average etching rate of the ion source on the two film materials
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Table 8. SiO2 monolayer membrane ion source parameters
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Table 9. Process parameters of filter film ion source
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Table 10. Final ion source process parameters
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