The characteristics of a metamaterial consisting of multilayered Ag/Si3N4 nanofilms are studied and the eigen mode expansion (EME) method is used to demonstrate the subwavelength imaging effect. A point source placed in the vicinity of the structure can form a image in the opposite side of the slab, the impedance match is not necessary since the Fabry-Perot condition is fulfiled (the thickness of the structure is an integer number of half-wavelengths) and the reflections from the interfaces are almost eliminated. The subwavelength imaging effect in this structure based on the self-collimation but not the negative refraction. This structure verifies that the use of one-dimensional metallodielectric (1D-MD) structure is a very prospective way of extending the use of near-field enhancement phenomenon into the optical region.