The CNx films are deposited on monocrystalline silicon substrates by pulsed laser deposition (PLD) technique with different laser fluxes and CNx coating as the target. The morphology，composition and microstructure of the films are characterized by scanning electron microscopy (SEM), energy dispersive X-ray spectroscopy (EDS) and X-ray photoelectron spectroscopy (XPS) respectively. The tribological behavior is investigated using a ball-on-disk tribometer in atmosphere (RH=48%~54%). The results show that an introduction of iterative PLD technique can improve the nitrogen content of the CNx films remarkably. With the increase of laser flux from 5 J/cm2 to 10 J/cm2, the percentage of N-sp2C bonding increases and the nitrogen atom fraction of the CNx film increases from 23.8% to 29.9%. A decreased percentage of N-sp3C and sp3C-C bonding of the CNx film are observed and the wear rate of CNx film increases from 2.1×10-15 m3/(N·m) to 9.0×10-15 m3/(N·m). The friction coefficient of the films ranges from 0.15 to 0.23. Compared with the others, the film deposited at laser flux 5 J/cm2 exhibites an optimal tribological performance.