• Chinese Journal of Lasers
  • Vol. 48, Issue 20, 2005001 (2021)
Xiaozhe Ma1、2, Fang Zhang1、*, and Huijie Huang1、2、**
Author Affiliations
  • 1Laboratory of Information Optics and Optoelectronic Technology, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China
  • 2Center of Materials Science and Optoelectronics Engineering, University of Chinese Academy of Sciences, Beijing 100049, China
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    DOI: 10.3788/CJL202148.2005001 Cite this Article Set citation alerts
    Xiaozhe Ma, Fang Zhang, Huijie Huang. Correction Technology for Illumination Field Intensity Profile in Photolithography Machine[J]. Chinese Journal of Lasers, 2021, 48(20): 2005001 Copy Citation Text show less
    Optical system structure of step-and-scan lithography[11-16]
    Fig. 1. Optical system structure of step-and-scan lithography[11-16]
    Spatial distribution of top-Gaussian illumination field
    Fig. 2. Spatial distribution of top-Gaussian illumination field
    Generation principle of top-Gaussian illumination field
    Fig. 3. Generation principle of top-Gaussian illumination field
    In traditional illumination mode, the spot intensity distribution formed by a field point of view of the illumination light field on the light field correction plate. (a) Size of defocusing spot formation on the field correction plate; (b) intensity distribution of the defocusing spot on the field correction plate
    Fig. 4. In traditional illumination mode, the spot intensity distribution formed by a field point of view of the illumination light field on the light field correction plate. (a) Size of defocusing spot formation on the field correction plate; (b) intensity distribution of the defocusing spot on the field correction plate
    Simulation model of optical system for generating the top-Gaussian illumination field
    Fig. 5. Simulation model of optical system for generating the top-Gaussian illumination field
    Illumination light field of three traditional lighting modes. (a) Illumination field 1; (b) illumination field 2; (c) illumination field 3
    Fig. 6. Illumination light field of three traditional lighting modes. (a) Illumination field 1; (b) illumination field 2; (c) illumination field 3
    Flow chart of transmittance distribution optimization algorithm of light field correction plate based on simulated annealing
    Fig. 7. Flow chart of transmittance distribution optimization algorithm of light field correction plate based on simulated annealing
    Tendency of Elost for three illumination fields during optimization. (a) Illumination field 1; (b) illumination field 2; (c) illumination field 3
    Fig. 8. Tendency of Elost for three illumination fields during optimization. (a) Illumination field 1; (b) illumination field 2; (c) illumination field 3
    Transmittance distributions of three optimized correctors. (a) Corrector 1; (b) corrector 2; (c) corrector 3
    Fig. 9. Transmittance distributions of three optimized correctors. (a) Corrector 1; (b) corrector 2; (c) corrector 3
    Comparison of the three illumination field intensity in non-scan and scan directions before and after correction. (a) Illumination field 1; (b) illumination field 2; (c) illumination field 3
    Fig. 10. Comparison of the three illumination field intensity in non-scan and scan directions before and after correction. (a) Illumination field 1; (b) illumination field 2; (c) illumination field 3
    Simulation results of three corrected illumination fields. (a) Illumination field 1; (b) illumination field 2; (c) illumination field 3
    Fig. 11. Simulation results of three corrected illumination fields. (a) Illumination field 1; (b) illumination field 2; (c) illumination field 3
    Non-scan directionScan direction
    DX/mmDuni/%DY_97 /mmDY_50 /mmDY_003 /mmDY_25~75 /mm
    ≥104≤0.304.2±0.513.2±0.422±1.5>2.9
    Table 1. Requirements of the top-Gaussian illumination field
    ElementSurface No.Surface typeRadius /mmConicThickness /mmMaterialComment
    MLAs1st MLA1Sphere1.602.00Fused silicaY MLA
    2Sphere-2.25X MLA
    2nd MLA3Aspheric0.50-0.390.75Fused silicaX MLA
    4Sphere-1.48Y MLA
    Diffuser1Sphereinf2.00Fused silica
    2Aspheric-0.70-2.78Y MLA
    Table 2. Design results of the microlenses of MLAs and diffuser
    No.Microlens’ pitch in non-scan direction /mmMicrolens’ pitch in scan direction /mm
    MLAs 10.520.19
    MLAs 20.520.19140.19150.19160.19170.1918
    0.19260.19340.19410.19490.1957
    MLAs 30.520.19590.19650.19680.19710.1975
    0.19820.19900.19980.20060.2014
    Diffuser0.00900.01900.02550.03200.0370
    0.04370.05000.05750.06780.8195
    Table 3. Pitch distributions of the microlenses of MLAs and diffuser
    No.Non-scan directionScan direction
    DX /mmDuni /%DY_97 /mmDY_50 /mmDY_003 /mmDY_25~75 /mm
    Illumination field 1107.601.443.7913.1827.863.69
    Illumination field 2107.551.444.1413.6827.963.69
    Illumination field 3107.551.444.3914.0827.963.72
    Table 4. Parameters of illumination light field of three traditional lighting modes
    No.Elost /%Non-scan directionScan directionTime-consuming of optimization /s
    DX /mmDuni /%DY_97 /mmDY_50 /mmDY_003 /mmDY_25~75 /mm
    Illumination field 11.87104.060.243.7913.1827.863.647.68
    Illumination field 21.92104.010.154.1413.6827.963.647.34
    Illumination field 31.88104.060.174.3914.0827.963.677.61
    Table 5. Parameters and energy loss of the three corrected illumination fields (correction results in non-scan direction)
    No.Elost /%Non-scan directionScan directionTotal time-consuming of optimization /s
    DX /mmDuni /%DY_97 /mmDY_50 /mmDY_003 /mmDY_25~75 /mm
    Illumination field 14.88104.060.263.7913.1823.463.379.15
    Illumination field 26.45104.010.194.1413.4823.463.158.87
    Illumination field 37.78104.060.224.3913.5823.463.009.09
    Table 6. Parameters and energy loss of the three corrected illumination fields (final corrected results)
    No.Elost /%Non-scan directionScan directionTime-consuming of simulation /h
    DX /mmDuni /%DY_97 /mmDY_50 /mmDY_003 /mmDY_25~75 /mm
    Illumination field 14.76104.060.293.7913.1823.363.444
    Illumination field 26.34104.010.224.1413.4823.363.244
    Illumination field 37.67104.060.254.3913.5823.363.054
    Table 7. Parameters and energy loss of the three corrected lighting fields (simulation results)
    Xiaozhe Ma, Fang Zhang, Huijie Huang. Correction Technology for Illumination Field Intensity Profile in Photolithography Machine[J]. Chinese Journal of Lasers, 2021, 48(20): 2005001
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