Author Affiliations
1Laboratory of Information Optics and Optoelectronic Technology, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China2Center of Materials Science and Optoelectronics Engineering, University of Chinese Academy of Sciences, Beijing 100049, Chinashow less
Fig. 1. Optical system structure of step-and-scan lithography
[11-16] Fig. 2. Spatial distribution of top-Gaussian illumination field
Fig. 3. Generation principle of top-Gaussian illumination field
Fig. 4. In traditional illumination mode, the spot intensity distribution formed by a field point of view of the illumination light field on the light field correction plate. (a) Size of defocusing spot formation on the field correction plate; (b) intensity distribution of the defocusing spot on the field correction plate
Fig. 5. Simulation model of optical system for generating the top-Gaussian illumination field
Fig. 6. Illumination light field of three traditional lighting modes. (a) Illumination field 1; (b) illumination field 2; (c) illumination field 3
Fig. 7. Flow chart of transmittance distribution optimization algorithm of light field correction plate based on simulated annealing
Fig. 8. Tendency of Elost for three illumination fields during optimization. (a) Illumination field 1; (b) illumination field 2; (c) illumination field 3
Fig. 9. Transmittance distributions of three optimized correctors. (a) Corrector 1; (b) corrector 2; (c) corrector 3
Fig. 10. Comparison of the three illumination field intensity in non-scan and scan directions before and after correction. (a) Illumination field 1; (b) illumination field 2; (c) illumination field 3
Fig. 11. Simulation results of three corrected illumination fields. (a) Illumination field 1; (b) illumination field 2; (c) illumination field 3
Non-scan direction | Scan direction |
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DX/mm | Duni/% | DY_97 /mm | DY_50 /mm | DY_003 /mm | DY_25~75 /mm | ≥104 | ≤0.30 | 4.2±0.5 | 13.2±0.4 | 22±1.5 | >2.9 |
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Table 1. Requirements of the top-Gaussian illumination field
Element | Surface No. | Surface type | Radius /mm | Conic | Thickness /mm | Material | Comment |
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MLAs | 1st MLA | 1 | Sphere | 1.60 | | 2.00 | Fused silica | Y MLA | 2 | Sphere | -2.25 | | X MLA | 2nd MLA | 3 | Aspheric | 0.50 | -0.39 | 0.75 | Fused silica | X MLA | 4 | Sphere | -1.48 | | Y MLA | Diffuser | | 1 | Sphere | inf | | 2.00 | Fused silica | | 2 | Aspheric | -0.70 | -2.78 | Y MLA |
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Table 2. Design results of the microlenses of MLAs and diffuser
No. | Microlens’ pitch in non-scan direction /mm | Microlens’ pitch in scan direction /mm |
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MLAs 1 | 0.52 | 0.19 | MLAs 2 | 0.52 | 0.1914 | 0.1915 | 0.1916 | 0.1917 | 0.1918 | 0.1926 | 0.1934 | 0.1941 | 0.1949 | 0.1957 | MLAs 3 | 0.52 | 0.1959 | 0.1965 | 0.1968 | 0.1971 | 0.1975 | 0.1982 | 0.1990 | 0.1998 | 0.2006 | 0.2014 | Diffuser | | 0.0090 | 0.0190 | 0.0255 | 0.0320 | 0.0370 | 0.0437 | 0.0500 | 0.0575 | 0.0678 | 0.8195 |
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Table 3. Pitch distributions of the microlenses of MLAs and diffuser
No. | Non-scan direction | Scan direction |
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DX /mm | Duni /% | DY_97 /mm | DY_50 /mm | DY_003 /mm | DY_25~75 /mm |
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Illumination field 1 | 107.60 | 1.44 | 3.79 | 13.18 | 27.86 | 3.69 | Illumination field 2 | 107.55 | 1.44 | 4.14 | 13.68 | 27.96 | 3.69 | Illumination field 3 | 107.55 | 1.44 | 4.39 | 14.08 | 27.96 | 3.72 |
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Table 4. Parameters of illumination light field of three traditional lighting modes
No. | Elost /% | Non-scan direction | Scan direction | Time-consuming of optimization /s |
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DX /mm | Duni /% | DY_97 /mm | DY_50 /mm | DY_003 /mm | DY_25~75 /mm |
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Illumination field 1 | 1.87 | 104.06 | 0.24 | 3.79 | 13.18 | 27.86 | 3.64 | 7.68 | Illumination field 2 | 1.92 | 104.01 | 0.15 | 4.14 | 13.68 | 27.96 | 3.64 | 7.34 | Illumination field 3 | 1.88 | 104.06 | 0.17 | 4.39 | 14.08 | 27.96 | 3.67 | 7.61 |
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Table 5. Parameters and energy loss of the three corrected illumination fields (correction results in non-scan direction)
No. | Elost /% | Non-scan direction | Scan direction | Total time-consuming of optimization /s |
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DX /mm | Duni /% | DY_97 /mm | DY_50 /mm | DY_003 /mm | DY_25~75 /mm |
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Illumination field 1 | 4.88 | 104.06 | 0.26 | 3.79 | 13.18 | 23.46 | 3.37 | 9.15 | Illumination field 2 | 6.45 | 104.01 | 0.19 | 4.14 | 13.48 | 23.46 | 3.15 | 8.87 | Illumination field 3 | 7.78 | 104.06 | 0.22 | 4.39 | 13.58 | 23.46 | 3.00 | 9.09 |
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Table 6. Parameters and energy loss of the three corrected illumination fields (final corrected results)
No. | Elost /% | Non-scan direction | Scan direction | Time-consuming of simulation /h |
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DX /mm | Duni /% | DY_97 /mm | DY_50 /mm | DY_003 /mm | DY_25~75 /mm |
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Illumination field 1 | 4.76 | 104.06 | 0.29 | 3.79 | 13.18 | 23.36 | 3.44 | 4 | Illumination field 2 | 6.34 | 104.01 | 0.22 | 4.14 | 13.48 | 23.36 | 3.24 | 4 | Illumination field 3 | 7.67 | 104.06 | 0.25 | 4.39 | 13.58 | 23.36 | 3.05 | 4 |
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Table 7. Parameters and energy loss of the three corrected lighting fields (simulation results)