Researching | Reducing the stray light of holographic gratings by shifting the substrate a short distance in the direction parallel or perpendicular to the exposure interference fringes

Journals >Chinese Optics Letters >Volume 15 >Issue 10 >Page 100501 > Article

Chinese Optics Letters
Vol. 15, Issue 10, 100501 (2017)

Reducing the stray light of holographic gratings by shifting the substrate a short distance in the direction parallel or perpendicular to the exposure interference fringes

Donghan Ma and Lijiang Zeng^*

Author Affiliations

Department of Precision Instrument, State Key Laboratory of Precision Measurement Technology and Instruments, Tsinghua University, Beijing 100084, China

show less

DOI: 10.3788/COL201715.100501 Cite this Article Set citation alerts

Donghan Ma, Lijiang Zeng, "Reducing the stray light of holographic gratings by shifting the substrate a short distance in the direction parallel or perpendicular to the exposure interference fringes," Chin. Opt. Lett. 15, 100501 (2017) Copy Citation Text

show less

References

[1] G. Fortin, N. McCarthy. Appl. Opt., 44, 4874(2005).

[2] T. Glaser. Adv. Opt. Technol., 4, 25(2015).

[3] Q. Zhou, J. Pang, X. Li, K. Ni, R. Tian. Chin. Opt. Lett., 13, 110501(2015).

[4] J. Carr, M. Y. P. Desmulliez, N. Weston, D. McKendrick, G. Cunningham, G. McFarland, W. Meredith, A. McKee, C. Langton. Precis. Eng., 33, 263(2009).

[5] A. Kimura, W. Gao, A. Yoshikazu, L. Zeng. Precis. Eng., 34, 145(2010).

[6] X. Li, H. Wang, K. Ni, Q. Zhou, X. Mao, L. Zeng, X. Wang, X. Xiao. Opt. Express, 24, 21378(2016).

[7] T. J. Kessler, J. Bunkenburg, H. Huang, A. Kozlov, D. D. Meyerhofer. Opt. Lett., 29, 635(2004).

[8] F. Canova, O. Uteza, J. P. Chambaret, M. Flury, S. Tonchev, R. Fechner, O. Parriaux. Opt. Express, 15, 15324(2007).

[9] F. Kong, Y. Jin, S. Liu, S. Chen, H. Guan, K. He, Y. Du, H. He. Chin. Opt. Lett., 11, 102302(2013).

[10] E. K. Popov, L. V. Tsonev, M. L. Sabeva. Opt. Eng., 31, 2168(1992).

[11] Y. Li, H. Chen, S. Kroker, T. Käsebier, Z. Liu, K. Qiu, Y. Liu, E. B. Kley, X. Xu, Y. Hong, S. Fu. Chin. Opt. Lett., 14, 090501(2016).

[12] Z. Yu, L. Chen, W. Wu, H. Ge, S. Y. Chou. J. Vac. Sci. Technol. B, 21, 2089(2003).

[13] R. Rabady, D. Frankstein, I. Avrutsky. Opt. Lett., 28, 1665(2003).

[14] J. P. Marsh, D. J. Mar, D. T. Jaffe. Appl. Opt., 46, 3400(2007).

[15] W. Wang, M. Gully-Santiago, C. Deen, D. J. Mar, D. T. Jaffe. Proc. SPIE, 7739, 77394L(2010).

[16] J. Ge, B. Zhao, S. Powell, A. Fletcher, X. Wan, L. Chang, H. Jakeman, D. Koukis, D. B. Tanner, D. Ebbets, J. Weinberg, S. Lipscy, R. Nyquist, J. Bally. Proc. SPIE, 8450, 84502U(2012).

[17] R. Steiner, A. Pesch, L. H. Erdmann, M. Burkhardt, A. Gatto, R. Wipf, T. Diehl, H. J. P. Vink, B. G. Bosch. Proc. SPIE, 8870, 88700H(2013).

[18] H. Lin, L. Zhang, L. Li, C. Jin, H. Zhou, T. Huo. Opt. Lett., 33, 485(2008).

[19] X. Tan, Q. Jiao, X. Qi, H. Bayan. Opt. Express, 24, 5896(2016).

[20] D. Ma, L. Zeng. Opt. Lett., 40, 1346(2015).

[21] L. Shi, L. Zeng, L. Li. Opt. Express, 17, 21530(2009).

[22] L. Li, M. Xu, G. I. Stegeman, C. T. Seaton. Proc. SPIE, 835, 72(1987).

Data from CrossRef

[1] Juyou Du, Fengzhao Dai, Xiangzhao Wang. Alignment mark optimization for improving signal-to-noise ratio of wafer alignment signal. Applied Optics, 58, 9(2019).

Figures&Tables (11)

References (22)

Copy Citation Text

Donghan Ma, Lijiang Zeng, "Reducing the stray light of holographic gratings by shifting the substrate a short distance in the direction parallel or perpendicular to the exposure interference fringes," Chin. Opt. Lett. 15, 100501 (2017)

Download Citation

Set citation alerts for the article

Set citation alerts for the article

Save the article for my favorites

Paper Information

Recommended Topics

laser devices and laser physics

Lasers and Laser Optics

laser manufacturing

Instrumentation, Measurement and Metrology

Set citation alerts for the article

Please enter your email address