• Chinese Optics Letters
  • Vol. 11, Issue 5, 053002 (2013)
Weijing Liu and Bincheng Li
DOI: 10.3788/col201311.053002 Cite this Article Set citation alerts
Weijing Liu, Bincheng Li. Repetition rate dependence of absorption of fused silica irradiated at 193 nm[J]. Chinese Optics Letters, 2013, 11(5): 053002 Copy Citation Text show less

Abstract

Repetition rate-dependent absorbance measurements of synthetic fused silica at 193-nm irradiation are performed in the range of 50–1 000 Hz with an ArF laser calorimeter. The "apparent" single- and twophoton absorption coefficients are determined by measuring the laser fluence-dependent absorbance of fused silica samples with different thicknesses to separate the surface absorption and bulk absorption. The measurement results indicate a reversible nonlinear increase of both apparent single- and two-photon absorption coefficients with increasing repetition rate for the synthetic fused silica, whereas the surface absorption shows no dependence on the repetition rate.
Weijing Liu, Bincheng Li. Repetition rate dependence of absorption of fused silica irradiated at 193 nm[J]. Chinese Optics Letters, 2013, 11(5): 053002
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