Repetition rate dependence of absorption of fused silica irradiated at 193 nm

Weijing Liu; Bincheng Li

doi:10.3788/col201311.053002

Journals >Chinese Optics Letters >Volume 11 >Issue 5 >Page 053002 > Article

Chinese Optics Letters
Vol. 11, Issue 5, 053002 (2013)

Repetition rate dependence of absorption of fused silica irradiated at 193 nm

Weijing Liu and Bincheng Li

DOI: 10.3788/col201311.053002 Cite this Article Set citation alerts

Weijing Liu, Bincheng Li. Repetition rate dependence of absorption of fused silica irradiated at 193 nm[J]. Chinese Optics Letters, 2013, 11(5): 053002 Copy Citation Text

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Weijing Liu, Bincheng Li. Repetition rate dependence of absorption of fused silica irradiated at 193 nm[J]. Chinese Optics Letters, 2013, 11(5): 053002

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