A series of TiO2 single films with different oxygen partial pressures and baking temperatures are prepared by electron beam evaporation. Both the absorption and the laser induced damage threshold (LIDT) at the wavelength of 1064 nm are measured. The results show that by improving oxygen partial pressure or reducing baking temperature, the film absorption can be reduced obviously. As for the LIDT of the TiO2 films at 1064 nm, it is affected by not only the absorption but also the quality of the substrate surface. When the absorption of the coating is high, the intrinsic absorption is dominant in the laser damage process. However, when the absorption of the coating is low enough, even bits of impurities at the surface of the substrate lead to a sharp decline of the LIDT.