Amorphous boron nitride thin film was prepared on the titanium coated ceramic substrate by pulsed laser deposition technique (PLD). The microstructure of the film was examined by using X-ray diffraction, scanning electron microscopy and Raman spectroscopy. The electron field emission characteristics were investigated. The turn-on field was 4.6 V/μm. The current density was 50 μA/cm 2 at an electric field of 9 V/μm.